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| 论文编号: |
122214O120110167 |
| 第一作者所在部门: |
610组 |
| 中文论文题目: |
Protective Film for NiSO4·6H2O UV Light Filter Based on Diisocyanate-Bridged Polysilsesquioxane
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| 英文论文题目: |
Protective Film for NiSO4·6H2O UV Light Filter Based on Diisocyanate-Bridged Polysilsesquioxane
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| 论文题目英文: |
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| 作者: |
徐耀
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| 论文出处: |
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| 刊物名称: |
Journal of Materials Science and Engineering
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| 年: |
2011
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| 卷: |
5 |
| 期: |
2 |
| 页: |
1 |
| 联系作者: |
徐耀 |
| 收录类别: |
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| 影响因子: |
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| 摘要: |
To develop an effective moisture-resistant protective film for optical crystal, a new bridged silsesquioxane (BSQ) precursor,denoted as TDUPTS, was synthesized by reacting 3-aminopropyltriethoxysilane and 2, 4-toluene diisocyanate. Subsequently bridged polysilsesquioxane (BPSQ) sol was synthesized by polycondensing the as-prepared TDUPTS precursor under ammonia catalysis.Serial methyl-modified BPSQ sols were prepared by adding different amounts of hexamethyldisilazane (HMDS) to TB sol.Transparent thin films were obtained by dip-coating BPSQ or methyl-modified BPSQ sols on nickel sulfate hexhydrate (NSH,NiSO4·6H2O) crystal wafers. Tested by the systematic humidity experiments, these films all showed excellent moisture-resistance
protection for NSH filter. After 63 days in 90% humidity, only 3.3% transmittance losing was found for the NSH filter coated by BPSQ sol. The long and flexible bridging groups that decided the nonporous structure of the BPSQ films should be the main reason of the excellent moisture-resistance of film. |
| 英文摘要: |
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| 备注: |
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