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| 论文编号: |
122214O120120148 |
| 第一作者所在部门: |
704组 |
| 中文论文题目: |
用于1053 nm高功率脉冲激光的有序介孔减反射膜
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| 英文论文题目: |
Ordered mesoporous antireflective films for 1053 nm high power pulse laser？
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| 论文题目英文: |
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| 作者: |
孙菁华
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| 论文出处: |
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| 刊物名称: |
物理学报
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| 年: |
2012
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| 卷: |
61 |
| 期: |
20 |
| 页: |
206802-1-206802-7 |
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| 收录类别: |
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| 影响因子: |
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| 摘要: |
Single-layer silica films are prepared via evaporation-induced-self-assembling process using triblock copolymer surfactant F127 as template and tetraethoxysiliane as precursor under acidic condition. After ammonia pretreatment, the as-deposited films undergo a thermal decomposition process to remove the surfactant, and the mesopores are formed in film. Three techniques are used to characterize the mesoscopic structure of film, i.e., grazing-incidence X-ray diffraction, nitrogen adsorption/desorption and transmission electron microscopy. The results indicate that the film has an ordered cage-like porous structure and can be indexed as the body-centered-cubic arrangement. The optical properties of the films are investigated via ellipsometry and UV-VIS-NIR transmission spectrometer. The transmitance can reach up to 99.9% at 1053 nm wavelength. The refractive index varies with the molar ratio of F127/Si. Atomic force microscope is used to probe the surface morphology, and the surface roughness Ra is 1.2 nm. A 1053 nm laser is used to determine the laser damage threshold of film and all the thresholds are higher than 25 J·cm？2 (1 ns). This method has a potential application in the
preparation of large-aperture antireflective films. |
| 英文摘要: |
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